EUV damage threshold measurements of Mo/Si multilayer mirrors
نویسندگان
چکیده
We present 1-on-1 and 10-on-1 damage threshold investigations on Mo/Si multilayers with EUV radiation of 13.5 nm wavelength, using a table-top laser produced plasma source based on solid gold as target material. The experiments were performed on different types of Mo/Si mirror, showing no significant difference in single pulse damage thresholds. However, the damage threshold for ten pulses is ≈60 % lower than the single pulse threshold, implying a defect dominated damage process. Using Nomarski (DIC) and atomic force microscopy (AFM) we analysed the damage morphologies, indicating a primarily thermally induced damage mechanism. Additionally, we studied the radiationinduced change of reflectivity upon damage of a multilayer mirror.
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